The ELIT3.0 (Elliptical Implant Test) phantom has been developed to generate uniform exposure for implants in the MITS3.0 system and enables automated testing with DASY AIMD. ELIT3.0 allows the exposure of implants with long leads to constant amplitude and phase for worst-case RF exposure evaluation.
MITS ELIT3.0 vertical phantom.
There are two modalities of the phantom: ELIT3.0 and H-ELIT3.0, which are used respectively in the vertical and horizontal modalities of the MITS3.0 system.
The ELIT3.0 meets the specifications of the current ISO/TS 10974 Test Requirements.
Material |
Transparent Plexiglass (PMMA) |
Liquid compatibility |
Compatible with sugar- and oil-based tissue simulating media. |
Dimensions |
Length 500 mm; Height 300 mm; Width 90 mm Submerged depth of implant 84 mm |
Wall thickness |
11 mm |
Racetrack material |
FR-4 Glass reinforced epoxy |
Racetrack dimensions |
Length 336 mm; Height 131.7 mm; Circumference 825 mm Width x 1 track 2.1 mm; Width x 3 tracks 26.3 mm Track spacing 10mm |
Amplitude and phase along top of racetrack
|
Etan 75 ± 5% of Emax Phase 0 ± 8° |